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檢測服務

韓國食品級

KFDA 韓國
Material
Test Item
合成樹脂
Synthetic Resin
(general standard)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
(except for PF, UF, MF, POM)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
PVC
Dibutyltin
Vinylchloride Monomer(VCM)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
phthalates(DBP,BBP,DEHP,DnOP,DINP,DIDP,DEHA) (in water, 4% acetic acid, 20% ethanol and n-heptane)
Cresylphosphoric ester
PP,EVA, PPS,
PMP(polymethylpentene), PVA(Polyvinyl Alcohol), PB-1 ( Polybutene-1), Polyimide(PI),
 Hydroxybutyl(HBP), Fluoro Resins(FR), Ionomer resin, Polyethylene naphthalate(PEN), Ethylene Vinyl Polyetheretherketone(PEEK),
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
PS, Polyphenylene ether
(PPE),
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Volatile matter
PVDC
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Barium
Vinylidene chloride
PET
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Soluble Antimony in 4% acetic acid(Elution)
Soluble Germanium in 4% acetic acid(Elution)
Terephthalic acid (elution)
Isophthalic acid(Elution)
 
 
 
 
PF(Phenol formaldehyde)
 
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Phenol(Elution-4% acetic acid)
Formaldehyde(Elution-4% acetic acid)
MF(melamine formaldehyde)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Phenol(Elution-4% acetic acid)
Formaldehyde(Elution-4% acetic acid)
melamine(Elution-4% acetic acid)
UF
(ureaformaldehyde)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Phenol(Elution-4% acetic acid)
Formaldehyde(Elution-4% acetic acid)
Acrylic resin
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Methylmethacrylate(Elution-20% ethanol) (contains over 50% methylmethacrylate)
PA
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
4,4'-methylenedianiline(Elution-4% acetic acid)
Ethylenediamine(Elution)
Hexamethylenediamine(Elution)
Caprolactam(Elution-20% ethanol)
PC
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
BPA(include phenol, BPA,pt-butylphenol)
Bisphenol A(Elution-include phenol, BPA,pt-butylphenol))
Diphenylcarbonate
Amines(Triethylamine and tributylamine)
PU
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
4,4'-methylenedianiline( acetic acid)
isocyanate(in water, 4% acetic acid, 20% ethanol and n-heptane)
ABS, AS
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Volatile matter
1,3-butadiene
Acrylonitrile(Elution-water)(
Polymethacrylstyrene(MS)
Volatile matter
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Methylmethacrylate(Elution-20% ethanol)
PAN
平底鍋,盤子
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Acrylonitrile(Elution-water)
 
MABS
Volatile matter
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
1,3-butadiene
Acrylonitrile(Elution-water)
Methylmethacrylate(Elution-20% ethanol)
4,4'-methylenedianiline( acetic acid)
Epoxy resin
BPA(Elution-include phenol, BPA,pt-butylphenol))
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
BPA diglycidyl ether(elution)
BPA F diglycidyl ether(elution)
Epichlorohydrin(elution-n-heptane)
Amines
PCT
Terephthalic acid (elution)
Isophthalic acid(Elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Antimony in 4% acetic acid
PE
1- hexane(elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
1-octene(elution)
Polyarylsulfone
(PASF)
Bisphenol A(Elution-include phenol, BPA,pt-butylphenol))
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
4,4'-dichlorodiphenyl sulfone(Elution)
PES
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
4,4'-dichlorodiphenyl sulfone(Elution)
POM
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Formaldehyde(Elution-4% acetic acid)
PBT
Terephthalic acid (elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Isophthalic acid(Elution)
PAR
Terephthalic acid (elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Isophthalic acid(Elution)
Bisphenol A(Elution-include phenol, BPA,pt-butylphenol))
PLA/PBSA
 
As(elution
formaldehyde in 4% acetic acid (elution)
flurescent matter
PMP
(polymethylpentene)
4-methyl-1-pentene (elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
PPS
(poly(phenylenesufide)
1,4-dichlorobenzene(elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Crosses-linked polyester resin
聚脂樹脂
Terephthalic acid (elution)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
Heavy metal as lead(Elution)
Consumption of Potassium Permanganate(Elution)
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
Isophthalic acid(Elution)
玻璃紙
cellophane( regenerated cellulose film)
As in 4% acetic acid (elution)
total Pb
total Cd
total Hg
total Cr(VI)
Heavy metal as lead (Elution)
Evaporation Residues (4% acetic acid)
Rubber,silicone resin,
BDR(Butadiene resins), TPE
2-mercaptoimidazoline
Total lead
Total cadmium
Heavy metal as lead in 4% acetic acid
Evaporation Residues (water, 20% ethanol for oil food)
Evaporation Residues (water)----for rubber pacifiers
Phenol in 4% acetic acid(Elution)
Formaldehyde in 4% acetic acid (Elution)
Zinc in 4% acetic acid (elution)
Zinc in water(elution)
Nitrosamine and nitrosatable substances (only for rubber nipple)
紙制品
Paper /processed paper
PCBs(AC 1221, AC1232, AC 1242, AC1248, AC1254, AC1260)
Total lead
Total Cadmium
Total Mercury
Total Chromium(VI)
As in  4% acetic acid (elution)
Heavy metal as lead in 4% acetic acid (Elution)
Evaporation Residues
Formaldehyde in water (Elution)
flurescent matter
 
 
 
 
 
Metal containers, packages
and apparatus
 
 
 
 
 
 
 
 
Pb, Cd,Ni in water( food pH >5)or 0.5% citric acid(food pH<5)
Cr(VI) in in water( food pH >5)or 0.5% citric acid(food pH<5)
As in 4% acetic acid
 
Evaporation Residues (water)
Evaporation Residues (4% acetic acid)
Evaporation Residues (20% ethanol)
Evaporation Residues (n-heptane)
formaldehyde in 4% acetic acid (elution)(with coating)
Vinylchloride Monomer(Elution)
Epichlorohyfrin(Elution)
BPA(Elution-include phenol, BPA,pt-butylphenol)
BPA diglycidyl ether(elution)
BPA F diglycidyl ether(elution)
Wood 木頭
As in water (elution)
Heavy metal as lead in water (Elution)
sulfur dioxide in water (elution)
ortho-phenylphenol in 20% ethanol(elution)
thiabendazole in 20% ethanol(elution)
biphenyl in 20% ethanol(elution)
imazalil in 20% ethanol (elution)
玻璃,陶瓷glass, ceramic,enamel, pottery
Cadmium(Elution)
Lead(Elution)
As (elution)(only for pottery)
 
 
淀粉
starch
lead
cadmium
Total Mercury
Total Chromium(VI)
As in water(elution)
Heavy metal as lead in 4% acetic acid (Elution)
formaldehyde in 4% acetic acid (elution)
Consumption of Potassium Permanganate(Elution)
flurescent matter